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专利名称：Substrate position detecting apparatus,
substrate processing apparatus usingsubstrate position detecting apparatus, anddeposition apparatus
发明人：Katsuyoshi Aikawa申请号：US14104049申请日：20131212公开号：US09404184B2公开日：20160802
专利附图：
摘要：A substrate position detecting apparatus detects a position of a substrate
inside a chamber from an image of a target inside the chamber. The apparatus includes animage pickup device to pick up the image of the target inside the chamber through awindow, an illumination device to irradiate light upwards, an illumination reflecting plateprovided above the illumination device and including a reflecting surface to reflect thelight from the illumination device towards the window, and a reflection restricting partprovided on the reflecting surface to form a shadow in a predetermined region thatincludes the target inside the chamber.
申请人：Tokyo Electron Limited
地址：Tokyo JP
国籍：JP
代理机构：IPUSA, PLLC
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